MeCoSput is a sputtering unit with DC-glow plasma at athmospheric pressure. The plasma accelerates ions onto a metall wire where atoms are removed.
At the same time, the flow of process gases helium and argon accelerate the atoms towareds the substrate. This process forms a layer of the removed atoms on the substrate.
Because of the comapct size it is a handy and flexible instrument to integrate this novell technology into numerous processes easily. The head is cooled with a closed water-cooling system, which ensured a low operating temperature of the whole system - even with several heads in parallel.
Versatile and Innovative
The MeCoSput is a versatile compact sputtering unit. It has the potential to fit different applications.
The head can be mounted to a static or moving applicator. Hand-held applications are also possible. Utilizing structure widths in the sub-millimeter range (700 µm) and high distances to the substrate opens numerous possibilities:
- Metallization of plastic material
- Printing of conductive traces
- Preparation of Electron Microscope probes
- Generation of Nano-Particles
With constant optimization of the head, BEAPLAS managed to reduce the utilization of process resources and increased the the deposition rates at the same time.
Applying a closed cooling concept no additional resources are wasted (e.g. water).
- Depsositon rate above mg/h
- Rates up to 500 nm/s
- low thermal stress for the substrate (< 1W)
Feel free to contact us for more detailled technical information or an individual quote.